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Inthispaperweproposeanewmetal-gateCMOStechnologythatusesacombinationoftwometalstoachievealowthresholdvoltageforbothn-andp-MOSFET's.,2007年12月24日—因為在dualmetal中,分別使用nMOS和pMOS兩種workfunction相異的metalgate材料來控制臨界電壓。「dualmetal...
Dual Work Function CMOS Gate Technology Based on ...
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由IPolishchuk著作·2001·被引用6次—Inthispaperweproposeanewmetal-gateCMOStechnologythatusesacombinationoftwometalstoachievealowthresholdvoltageforbothn-and ...
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